Plasma-chlorinated electrode and organic electronic devices using the same

A method is disclosed for elevating the work function of conductive layers such as indium tin oxide by chlorine-containing plasma exposure or etching. Also disclosed are electronic devices such as organic light-emitting diodes and organic photovoltaic cells with a chlorine plasma-treated conductive layer as the hole-injecting or hole-accepting electrode. The performance of the devices is enhanced due to an increased work function of the plasma-treated electrode.

Patent number